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Study of SiO2 surface sputtering by a 250–550 keV He+ ion beam during high-resolution Rutherford backscattering measurements

✍ Scribed by Susumu Kusanagi; Hajime Kobayashi


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
250 KB
Volume
249
Category
Article
ISSN
0168-583X

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