✦ LIBER ✦
Study of Reactive Ion Etching of the Si[sub 3]N[sub 4]∕GaAs Interface in CF[sub 4] Plasmas by X-Ray Photoelectron Spectroscopy and X-Ray Photoelectron Diffraction
✍ Scribed by Alnot, P.
- Book ID
- 125491161
- Publisher
- The Electrochemical Society
- Year
- 1989
- Tongue
- English
- Weight
- 759 KB
- Volume
- 136
- Category
- Article
- ISSN
- 0013-4651
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