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Study of oxidized iron thin films by non-Rutherford elastic scattering

✍ Scribed by F. Jiménez-Villacorta; A. Muñoz-Martín; C. Prieto

Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
183 KB
Volume
249
Category
Article
ISSN
0168-583X

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✦ Synopsis

Rutherford and non-Rutherford elastic scattering analyses have been performed to characterize oxidized iron thin films grown by sputtering. The oxygen depth profiles along the thickness of all the samples have been studied in order to unravel the oxidation process of these samples. The oxygen concentration along the film was related to the sample preparation parameters, resulting in a strong dependence of oxygen depth profile on the substrate temperature during deposition.

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Magnetic properties of oxidized iron thin films grown by sputtering at very low temperatures
✍ F. Jiménez-Villacorta; A. Muñoz-Martín; R. Ramírez; C. Prieto 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 381 KB

Iron thin films have been grown by DC magnetron sputtering using Si(100) wafers as substrates, and then oxidized in a well-controlled oxygen atmosphere in the vacuum chamber. Film thickness is about 50 nm, and grains forming these samples do not exceed 20 nm. In order to control structural propertie