## Abstract Two carbide forming metals, titanium and tantalum, and a typical non carbide former, copper, were treated by methane plasma immersion ion implantation. The polished metal samples were exposed to high voltage pulses at โ20 kV in an atmosphere of methane. The lateral distribution of the c
โฆ LIBER โฆ
Study of new surface structures created on sapphire by Co ion implantation
โ Scribed by C Marques; M.M Cruz; R.C da Silva; E Alves
- Book ID
- 114164482
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 108 KB
- Volume
- 175-177
- Category
- Article
- ISSN
- 0168-583X
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