Study of nano-mechanical properties for thin porous films through instrumented indentation: SiO2 low dielectric constant films as an example

✍ Scribed by M. Herrmann; F. Richter; S.E. Schulz

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 215 KB
• Volume: 85
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2008.03.006