๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Study of isotropic etching behavior of CR-39(DOP) polymer through ion tracks

โœ Scribed by Kalpana Sharma; P.K. Diwan; S. Kumar; P. Yadav


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
223 KB
Volume
268
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Sensitivity study of Hungarian made CR-3
โœ Zs. Kocsis; R. Brand ๐Ÿ“‚ Article ๐Ÿ“… 1993 ๐Ÿ› Elsevier Science โš– 97 KB

The etchzng propertzes of Hungarian made CR-}9 detector were studzed for energetic 209Bi and 197Au zone. The bulk and track etch rates were measured at various temperatures and concentrations of the etchant. These data were compared to data obtazned by Italian made CR-39. The experimental errors of

Experimental range of heavy ions of char
โœ Shyam Kumar; S.K. Sharma; A.K. Garg; A.P. Sharma ๐Ÿ“‚ Article ๐Ÿ“… 1990 ๐Ÿ› Elsevier Science โš– 358 KB

The present work describes the experimental measurement of the total etchable range for different heavy ions, ':C (8.7 MeV/N), ':O (8.7 MeV/N). :gNe (7.7 MeV/N), $i (6.4 MeV/N), $Fe (6.4 MeV/N) and i:Ni (6.5 MeViN) in CR-39 (Dop) and Lexan polycarbonate plastic track detectors. The energy loss rate