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Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure

✍ Scribed by Y.K. Lee; Khin Maung Latt; Thomas Osipowicz; Cham Sher-Yi


Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
149 KB
Volume
3
Category
Article
ISSN
1369-8001

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