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Study of a three dimensional model of the mechanisms of exposure and development of a positive photoresin : A. Brochet, G. M. Dubroeucq and M. Lacombat. Rev. Technique Thomson-CSF9, (2) 285 (June 1977). (In French only)


Publisher
Elsevier Science
Year
1978
Tongue
English
Weight
251 KB
Volume
17
Category
Article
ISSN
0026-2714

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