## Abstract Low‐power, plasma‐enhanced (PE)CVD together with polymerization of methyl methacrylate (MMA) can be used to deposit thin films of poly(methyl methacrylate) (PMMA) with minimal loss of functional groups, as shown by Fourier transform infrared (FTIR) spectroscopy, X‐ray photoelectron spec
Studies on the effect of electrode type and substrate temperature on plasma polymerization of two model compounds: Acrylonitrile and hexamethyldisiloxane
✍ Scribed by G. Akovali; N. Dilsiz
- Publisher
- Society for Plastic Engineers
- Year
- 1990
- Tongue
- English
- Weight
- 343 KB
- Volume
- 30
- Category
- Article
- ISSN
- 0032-3888
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✦ Synopsis
Abstract
Polymers were prepared from saturated (HMDS) and unsaturated (AN) monomers in a radio frequency discharge (plasma). The effect of selected parameters such as electrode type (such as Cu, Zn, Ni, Al), reactor type, and substrate temperature (other parameters constant) on chemical structure and the rate of polymer deposition was examined by Fourier transform infrared (FTIR) spectroscopy. Differences in the nature of electrodes and reactor types were found to yield similar plasma products with similar rates of deposition for two monomers. In the tubular reactor used, deposition rates were observed to decrease with increasing substrate temperatures showing different dependencies on temperature for the monomers tested.
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