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Studies on sensitivity and etching resistance of calix[4]arene derivatives as negative tone electron beam resists

✍ Scribed by A. Ruderisch; H. Sailer; V. Schurig; D.P. Kern


Book ID
114155524
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
288 KB
Volume
67-68
Category
Article
ISSN
0167-9317

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