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Studies of Cds photocells with electroplated CuxS

โœ Scribed by Jacques Vedel; Pierre Cowache; Daniel Lincot

Publisher
Elsevier Science
Year
1984
Weight
335 KB
Volume
11
Category
Article
ISSN
0379-6787

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โœฆ Synopsis

Photocells were prepared by electroplating cuprous sulphide onto evaporated CdS by means of a solution containing triethylenetetraamine (trien) and copper(II). The collection grid was also electroplated. During the CuxS formation the codeposition of copper causes the equilibration of Cu~S to Cu2S during the thermal treatment. Capacitance-voltage plots show that copper diffusion occurs only during the thermal treatment and not during electroplating. Cells of 3 cm 2 area were prepared with a 7% efficiency {opencircuit voltage Voยข = 0.52 V; short-circuit current density Jsc = 22 mA cm-2; fill factor FF = 0.62).

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Measurements of the cathodoluminescence (CL) from CuxS-CdS cells have been made with a view to determining the value of this technique for monitoring changes (during cell fabrication or during subsequent operation) in the characteristics of the Cu/S absorber layer. Two peaks in the CL spectrum (at =