Structures and Energetics of Some Potential Intermediates in Titanium Nitride Chemical Vapor Deposition: TiCl m (NH 2 ) n , TiCl m (NH 2 ) n NH, and TiCl m (NH 2 ) n N. An ab Initio Molecular Orbital Study

✍ Scribed by Baboul, Anwar G.; Schlegel, H. Bernhard

• Book ID: 127182130
• Publisher: American Chemical Society
• Year: 1998
• Tongue: English
• Weight: 100 KB
• Volume: 102
• Category: Article
• ISSN: 0022-3654
• DOI: 10.1021/jp9810668