Structure modification of magnetron-sputtered CrN coatings by intermediate plasma etching steps

✍ Scribed by H.-S. Park; H. Kappl; K.H. Lee; J.-J. Lee; H.A. Jehn; M. Fenker

• Book ID: 108422809
• Publisher: Elsevier Science
• Year: 2000
• Tongue: English
• Weight: 279 KB
• Volume: 133-134
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/s0257-8972(00)00960-9