The crystalline structure profile of the compound layer obtained by pulsed plasma nitriding in steel gears is reported. The nitrogen depth profile obtained by Radio Frequency Glow Discharge Optical Emission Spectroscopy is correlated with both the nano-hardness and the crystalline Ξ΅-Fe 3 N /Ξ³β²-Fe 4
β¦ LIBER β¦
Structure and useful properties of multi-component titanium nitride obtained by pulse plasma deposition
β Scribed by A. Michalski
- Publisher
- Springer
- Year
- 1991
- Tongue
- English
- Weight
- 218 KB
- Volume
- 10
- Category
- Article
- ISSN
- 0261-8028
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
Microstructure and properties of the com
β
E.A. Ochoa; D. Wisnivesky; T. Minea; M. Ganciu; C. Tauziede; P. Chapon; F. Alvar
π
Article
π
2009
π
Elsevier Science
π
English
β 725 KB
Study of the structure and electrical pr
β
C. Gallardo-Vega; W. de la Cruz
π
Article
π
2006
π
Elsevier Science
π
English
β 222 KB
Structure and properties of coatings com
Structure and properties of coatings composed of TiN-Ti obtained by the reactive pulse plasma method
β
A. Michalski
π
Article
π
1984
π
Springer
π
English
β 875 KB
Structural and optical properties of Bi1
β
L. Escobar-AlarcΓ³n; E. Haro-Poniatowski; M. FernΓ‘ndez-Guasti; A. Perea; C.N. Afo
π
Article
π
1999
π
Springer
π
English
β 521 KB
Microstructure and mechanical properties
β
Zhijian Peng; Hezhuo Miao; Longhao Qi; Jianghong Gong; Size Yang; Chizi Liu
π
Article
π
2003
π
Springer
π
English
β 653 KB
Effects of substrate bias and argon flux
β
Zhang, Y. J. ;Yan, P. X. ;Wu, Z. G. ;Zhang, W. W. ;Zhang, G. A. ;Liu, W. M. ;Xue
π
Article
π
2005
π
John Wiley and Sons
π
English
β 364 KB
## Abstract Highβquality titanium nitride (TiN) films with nanoβstructure were prepared at ambient temperature on (111) silicon substrates by filtered cathodic arc plasma (FCAP) technology with an inβplane βSβ filter. The effects of substrate bias and argon flux on the crystal grain size, roughness