Structure and microhardness of TiN compositional and alloyed films
β Scribed by R.A. Andrievski; I.A. Anisimova; V.P. Anisimov
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 432 KB
- Volume
- 205
- Category
- Article
- ISSN
- 0040-6090
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
## by D.J. Lockwood) Microhardness measurements have been performed on porous silicon (Psi) films. The dependence of the hardness on porosity, morphology and the underlying silicon substrate has been established. A model which determines the intrinsic film hardness has been developed and experimen
The properties of ZrCu and ZrCu-N films magnetron sputtered from an alloyed ZrCu (70/30 wt.%) target in Ar and Ar#N 2 at the same total pressure of 0.7 Pa, respectively, are reported. Zr and Cu are immiscible elements in this composition range resulting in characteristic film properties. A ZrCu film