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Structural study of ultrathin metal films on TiO2 using LEED, ARXPS and MEED

✍ Scribed by Jian-Mei Pan; BrianL. Maschhoff; Ulrike Diebold; TheodoreE. Madey


Publisher
Elsevier Science
Year
1993
Weight
69 KB
Volume
291
Category
Article
ISSN
0167-2584

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Structural characterization of DC magnet
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Titanium dioxide films have been deposited using DC magnetron sputtering technique onto well-cleaned p-silicon substrates at an oxygen partial pressure of 7 Γ‚ 10 -5 mbar and at a sputtering pressure (Ar+O 2 ) of 1 Γ‚ 10 -3 mbar. The deposited films were calcinated at 673 and 773 K. The composition of