Structural and some other properties of silicon deposited in an SiCl4H2 r.f. discharge

✍ Scribed by Z. Iqbal; P. Capezzuto; M. Braun; H.R. Oswald; S. Vepřek; G. Bruno; F. Cramarossa; H. Stüssi; J. Brunner; M. Schärli

• Publisher: Elsevier Science
• Year: 1982
• Tongue: English
• Weight: 518 KB
• Volume: 87
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(82)90569-7