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Stress behavior of TIN films formed by reactive ion-beam-assisted deposition

โœ Scribed by Wang Xi; Liu Xianghuai; Yang Genqing; Zheng Zhihong; Huang Wei; Zou Shichang

Book ID
119125084
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
369 KB
Volume
16
Category
Article
ISSN
0167-577X

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Indium tin oxide (ITO) films were produced by low-energy oxygen ion beam assisted electron-beam evaporation. The dependence of surface morphology, electrical and optical properties on evaporation rate, oxygen ion beam energy and density, as well as substrate temperatures was characterized by atomic