Strain relaxation and dopant distribution in the rapid thermal annealing of Co with Si/Si1−xGex/Si heterostructure

✍ Scribed by Y Miron; M Efrati Fastow; C Cytermann; R Brener; M Eizenberg; M Glück; H Kibbel; U König

• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 201 KB
• Volume: 1
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/s1369-8001(98)00032-8