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Strain engineered segregation regimes for the fabrication of thin Si[sub 1−x]Ge[sub x] layers with abrupt n-type doping

✍ Scribed by Berbezier, I.; Ayoub, J. P.; Ronda, A.; Oehme, M.; Lyutovich, K.; Kasper, E.; Di Marino, M.; Bisognin, G.; Napolitani, E.; Berti, M.


Book ID
127181397
Publisher
American Institute of Physics
Year
2010
Tongue
English
Weight
669 KB
Volume
107
Category
Article
ISSN
0021-8979

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