✦ LIBER ✦
Strain characterization in SOI and strained-Si on SGOI MOSFET channel using nano-beam electron diffraction (NBD)
✍ Scribed by Koji Usuda; Toshinori Numata; Toshifumi Irisawa; Norio Hirashita; Shinichi Takagi
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 174 KB
- Volume
- 124-125
- Category
- Article
- ISSN
- 0921-5107
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