Stochastic closed-loop model predictive
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Dennis Van Hessem; Okko Bosgra
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Article
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2006
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Elsevier Science
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English
โ 345 KB
A new predictive control framework for chemical processes is presented, that has a number of fundamental differences to classical MPC. Both future disturbances and future process measurements are explicitly introduced in the model prediction, while back-off prevents violation of the inequality const