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Step-flow growth of homoepitaxial ZnO thin layers by halide vapor phase epitaxy using ZnCl2 and H2O source gases

✍ Scribed by Rui Masuda; Tetsuo Fujii; Naoki Yoshii; Yoshinao Kumagai; Akinori Koukitu


Book ID
108166093
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
717 KB
Volume
312
Category
Article
ISSN
0022-0248

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