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Steady state defect density and annealing kinetics of light-induced defects in a-Si:H deposited from ‘new’ deposition techniques

✍ Scribed by Ian S. Osborne; Nobuhiro Hata; Akihisa Matsuda


Book ID
115991046
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
273 KB
Volume
198-200
Category
Article
ISSN
0022-3093

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