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State estimation approach for determining composition and growth rate of Si_1-xGe_x chemical vapor deposition utilizing real-time ellipsometric measurements

✍ Scribed by Middlebrooks, Scott A. ;Rawlings, James B.


Book ID
115353112
Publisher
The Optical Society
Year
2006
Tongue
English
Weight
297 KB
Volume
45
Category
Article
ISSN
1559-128X

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