Stability of erbium and silver implanted in silica–titania sol–gel films

✍ Scribed by A.R. Ramos; C. Marques; E. Alves; A.C. Marques; R.M. Almeida

• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 228 KB
• Volume: 240
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2005.06.138

✦ Synopsis

We implanted silica-titania sol-gel films with 3 • 10 15 at./cm 2 , 180 keV Er + and 6 • 10 16 at./cm 2 , 140 keV Ag + ions. The energies were chosen so that the profiles of Ag and Er overlap. RBS and ERDA were used to study the behaviour of Ag, Er and H during the heat treatments used to densify the films. Implantation causes H depletion at the film surface and an increase in H concentration just beneath the implanted Ag and Er profiles. The total H content decreases by 27% to 75% during implantation. During annealing the H content decreases, with an almost complete H loss after annealing for 35 min at 800 °C. The Ag profile remains stable up to 600 °C. Above 700 °C Ag becomes increasingly mobile. Annealing at 800 °C for 35 min results in a nearly constant Ag distribution in the film. The Er profile remains unchanged with heat treatment up to the maximum temperature used (800 °C).