Sputtering yield of chromium by argon an
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A. K. Handoo; P. K. Ray
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Article
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1992
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Springer
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English
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A radioactive tracer technique is described for the quantitative measurement of the sputtering yield of a target material electroplated on a copper substrate. Sputtering yields of chromium by argon and xenon ions with energies from 50 to 500eV are reported. The ion beams, having a current density ra