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Sputtering yield coefficients of thin copper films bombarded by 3–15 keV Ar+ at an angle of incidence of 30°

✍ Scribed by C. Abatino; G. Luzzi; L. Papagno


Publisher
Elsevier Science
Year
1979
Tongue
English
Weight
404 KB
Volume
56
Category
Article
ISSN
0040-6090

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