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Sputtering yield and atomic mixing calculation of 200 Å thick Cu film bombarded by 180 keV Ar ions

✍ Scribed by O.F. Goktepe; P.A. Treado; J.M. Lambert; A.M. Vincenz


Book ID
113280368
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
260 KB
Volume
40-41
Category
Article
ISSN
0168-583X

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