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Sputtering of Germanium by 15 to 35 keV Noble Gas Ions

✍ Scribed by Ghose, D. ;Basu, D. ;Karmohapatro, S. B.

Publisher
John Wiley and Sons
Year
1983
Tongue
English
Weight
376 KB
Volume
77
Category
Article
ISSN
0031-8965

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Comparative study of silicon and germani
Comparative study of silicon and germanium sputtering by 1–20 keV Ar ions
✍ V.I. Shulga πŸ“‚ Article πŸ“… 2007 πŸ› Elsevier Science 🌐 English βš– 155 KB

Sputtering of amorphous Si and Ge targets by 1-20 keV Ar ions has been studied using the binary-collision simulation. Special attention was given to the angular distribution of sputtered atoms; namely, the energy dependence of the exponent n in the function cos n h approximating the angular distribu