Compact sputtering apparatus for deposit
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Yoshitaka Kitamoto; Masanori Abe; Masahiko Naoe
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Article
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1998
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Elsevier Science
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English
โ 347 KB
Co^Cr films deposited at excessively low Ar pressure P Ar often reveal critically poor c-axis orientation for the magnetron sputtering system. It has been found that high energy Ar atoms recoiled from the target plane would bombard heavily the growing films and degrade films' crystallographic charac