[Springer Series in Materials Science] Reactive Sputter Deposition Volume 109 || Modelling of Reactive Sputtering Processes

✍ Scribed by Depla, Diederik; Mahieu, Stijn

• Book ID: 121440823
• Publisher: Springer Berlin Heidelberg
• Year: 2008
• Tongue: English
• Weight: 635 KB
• Edition: 1
• Category: Article
• ISBN: 3540766642
• DOI: 10.1007/978-3-540-76664-3_4

✦ Synopsis

In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.