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Spontaneous growth of uniformly distributed In nanodots and InI3nanowires on InP induced by a focused ion beam

✍ Scribed by Callegari, Victor ;Nellen, Philipp M.


Book ID
105364302
Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
297 KB
Volume
204
Category
Article
ISSN
0031-8965

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✦ Synopsis


Abstract

We show the growth of hemispherical In nanodots due to differential sputtering by 30 keV gallium (Ga^+^) ions and of InI~3~ nanodots and nanowires due to chemical reactions with iodine on the surface of focused ion beam‐irradiated areas on a (100)InP substrate. Growth occurs exclusively on previously FIB‐fabricated nucleation‐sites in the form of craters and trenches. Surface topography and the native oxide on InP are identified as the factors determining the area of growth. Arbitrary 2D patterns can be generated with good control of localization and dimension of the nanostructures. Limitations of size and surface density of the nanodots and nanowires are discussed. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)