SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Optical/Laser Microlithography VIII - OPTIMASK: an OPC algorithm for chrome and phase-shift mask design

✍ Scribed by Barouch, Eytan; Hollerbach, Uwe; Vallishayee, Rakesh R.; Brunner, Timothy A.

• Book ID: 118148017
• Publisher: SPIE
• Year: 1995
• Weight: 313 KB
• Volume: 2440
• Category: Article
• DOI: 10.1117/12.209252