SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Optical/Laser Microlithography - Design and analysis of a high-NA projection optical system for 0.35-μm deep-UV lithography

✍ Scribed by Hill, Andrew V.; Webb, James E.; Phillips, Anthony R.; Connors, James E.; Cuthbert, John D.

• Book ID: 120474329
• Publisher: SPIE
• Year: 1993
• Weight: 791 KB
• Volume: 1927
• Category: Article
• DOI: 10.1117/12.150456