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SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, USA (Saturday 2 February 2013)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI - Precisely controlled plasmonic nanostructures and its application to nanolithography

✍ Scribed by Ueno, K.; Misawa, H.; von Freymann, Georg; Schoenfeld, Winston V.; Rumpf, Raymond C.

No coin nor oath required. For personal study only.

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