✦ LIBER ✦

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - FIB-based local deposition of dielectrics for phase-shift mask modification

✍ Scribed by Wanzenboeck, Heinz D.; Verbeek, Martin; Maurer, Wilhelm; Bertagnolli, Emmerich; Grenon, Brian J.; Dao, Giang T.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

SPIE Proceedings [SPIE Photomask Technol

✍ Buck, Peter D.; Bjuggren, Mans; Buenning, Hartmut; Garg, Vishal; Larsson, Johan; 📂 Article 📅 2001 🏛 SPIE ⚖ 160 KB

SPIE Proceedings [SPIE Photomask Technol

✍ Neureuther, Andrew R.; Hotta, Shoji; Adam, Konstantinos; Grenon, Brian J.; Dao, 📂 Article 📅 2001 🏛 SPIE ⚖ 553 KB

SPIE Proceedings [SPIE 14th Annual BACUS

✍ Tan, Zoilo C. H.; Sauer, Charles A.; Brodsky, William L.; Shelden, Gilbert V. 📂 Article 📅 1994 🏛 SPIE ⚖ 471 KB

SPIE Proceedings [SPIE 15th Annual BACUS

✍ Grenon, Brian J.; Defibaugh, D. C.; Sprout, Donna M.; Taft, C. J.; Shelden, Gilb 📂 Article 📅 1995 🏛 SPIE ⚖ 162 KB

SPIE Proceedings [SPIE Photomask Technol

✍ Kusunose, Hal; Yasui, Takashi; Higashikawa, Iwao; Kimmel, Kurt R.; Staud, Wolfga 📂 Article 📅 2003 🏛 SPIE ⚖ 415 KB