SPIE Proceedings [SPIE Optical Science and Technology, the SPIE 49th Annual Meeting - Denver, CO (Monday 2 August 2004)] Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II - A reflectance measurement system for investigating radiation damage to EUVL mirrors in NewSUBARU

✍ Scribed by Kakutani, Yukinobu; Niibe, Masahito; Kakiuchi, Kazuya; Takase, Hiromitsu; Terashima, Shigeru; Kondo, Hiroyuki; Matsunari, Shuichi; Aoki, Takashi; Gomei, Yoshio; Fukuda, Yasuaki; Khounsary, Ali M.; Dinger, Udo; Ota, Kazuya

• Book ID: 111972114
• Publisher: SPIE
• Year: 2004
• Weight: 435 KB
• Volume: 5533
• Category: Article
• DOI: 10.1117/12.559395