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SPIE Proceedings [SPIE Optical Engineering + Applications - San Diego, CA (Sunday 10 August 2008)] Advances in X-Ray/EUV Optics and Components III - Innovative approaches to surface sensitive analysis techniques on the basis of plasma-based off-synchrotron XUV/EUV light sources

โœ Scribed by Banyay, Matus; Juschkin, Larissa; Goto, Shunji; Khounsary, Ali M.; Morawe, Christian


Book ID
120482933
Publisher
SPIE
Year
2008
Weight
1020 KB
Volume
7077
Category
Article

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