✦ LIBER ✦
SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Design and Process Integration for Microelectronic Manufacturing II - Forbidden-area avoidance with spacing technique for layout optimization
✍ Scribed by Shi, Shi C.; Wong, Alfred K.; Ng, Tung-Sang; Liebmann, Lars W.
- Book ID
- 120524061
- Publisher
- SPIE
- Year
- 2004
- Weight
- 150 KB
- Volume
- 5379
- Category
- Article
No coin nor oath required. For personal study only.