✦ LIBER ✦
SPIE Proceedings [SPIE Microelectronics, MEMS, and Nanotechnology - Perth, Australia (Tuesday 9 December 2003)] Device and Process Technologies for MEMS, Microelectronics, and Photonics III - How to prevent a runaway chemical reaction in the isotropic etching of silicon with HF/HNO3/CH3COOH or HNA solution
✍ Scribed by Hui, Wing C.; Chiao, Jung-Chih; Hariz, Alex J.; Jamieson, David N.; Parish, Giacinta; Varadan, Vijay K.
- Book ID
- 120442054
- Publisher
- SPIE
- Year
- 2004
- Weight
- 399 KB
- Volume
- 5276
- Category
- Article
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