SPIE Proceedings [SPIE High-Power Lasers and Applications - San Jose, CA (Friday 18 January 2002)] Photon Processing in Microelectronics and Photonics - High-efficiency refractive index modification of fused silica by F2 and KrF excimer laser multiwavelength excitation process

✍ Scribed by Obata, Kotaro; Sugioka, Koji; Akane, Toshimitsu; Toyoda, Koichi; Midorikawa, Katsumi; Sugioka, Koji; Gower, Malcolm C.; Haglund, Jr., Richard F.; Pique, Alberto; Traeger, Frank; Dubowski, Jan J.; Hoving, Willem

• Book ID: 121466018
• Publisher: SPIE
• Year: 2002
• Weight: 174 KB
• Volume: 4637
• Category: Article
• DOI: 10.1117/12.491056