✦ LIBER ✦

Spectral characterization of Yb–doped silica layers for high power laser applications

✍ Scribed by David Eger; Gil Atar; Ariel Bruner; Bruno Sfez; Irit Juwiler; Temmu Kokki; Pekka Kykkänen

Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 453 KB
Volume: 33
Category: Article
ISSN: 0925-3467
DOI: 10.1016/j.optmat.2010.10.012

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Czochralski growth of Yb doped oxyapatit

Czochralski growth of Yb doped oxyapatite for high power laser application

✍ A Yoshikawa; C Fujiwara; H Sato; T Nishi; H Ohta; T Fukuda; Y Waseda; G Boulon; 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 406 KB

Fabrication and properties of Yb-doped s

Fabrication and properties of Yb-doped silica glass films for laser waveguide application

✍ A.-S. Jacqueline; V. Petit; F. Gourbilleau; P. Camy; J.-L. Doualan; R. Moncorgé; 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 224 KB

Spectroscopic characterization of Ho3+ d

Spectroscopic characterization of Ho3+ doped PbWO4 crystals for laser and stimulated Raman scattering applications in the mid-infrared spectral range

✍ Ilya S. Mirov; Vladimir V. Fedorov; Igor S. Moskalev; Dmitri V. Martyshkin; Serg 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 327 KB

Application of chemical-mechanical polis

Application of chemical-mechanical polishing for planarizing of silicon nitride passivation layers used in high power III-V laser devices

✍ Jiang Wei 📂 Article 📅 2006 🏛 John Wiley and Sons 🌐 English ⚖ 322 KB 👁 1 views

## Abstract Chemical‐mechanical polishing (CMP) allows the planarization of wafers with thin layer at its surface. Subject of this investigation was to apply CMP for planarizing silicon nitride (Si~3~N~4~) passivation layer in high power III‐V laser devices, which remained in the structure as the i