Space–charge-limited conduction in vacuum-deposited PVDF films

✍ Scribed by S. P. Bodhane; V. S. Shirodkar

• Publisher: John Wiley and Sons
• Year: 1999
• Tongue: English
• Weight: 196 KB
• Volume: 74
• Category: Article
• ISSN: 0021-8995
• DOI: 10.1002/(sici)1097-4628(19991107)74:6<1347::aid-app4>3.0.co;2-k

✦ Synopsis

Current-voltage characteristics of poly(vinylidene fluoride) (PVDF) films fabricated on glass substrates by thermal evaporation technique in the metal-polymermetal sandwich configuration were studied. The vacuum-deposited PVDF films were predominantly of ␣ form. However, when subjected to high-voltage, short-duration singular pulse, it possibly resulted in mixed ␣ ϩ ␤ form. The I-V curves of such films display the low-field ohmic region and the high-field square-law region. The current versus thickness curves in the square-law region and the transition voltage, V tr , versus thickness curves indicate the conduction process to be space-charge-limited. The analyses of the current-voltage characteristics indicated the presence of uniformly distributed high-trapping carrier densities on the order of 10 24 m Ϫ3 eV Ϫ1 with average activation energy of 0.263 eV.