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Source/drain extension region engineering in nanoscale double gate SOI MOSFETs: Novel design methodology for low-voltage analog applications

✍ Scribed by Abhinav Kranti; G. Alastair Armstrong


Book ID
108207737
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
273 KB
Volume
84
Category
Article
ISSN
0167-9317

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