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Some comments about crystallization of FeSi amorphous films

✍ Scribed by Marchal, G. ;Mangin, Ph. ;Piecuch, M. ;Janot, Chr.


Publisher
John Wiley and Sons
Year
1979
Tongue
English
Weight
123 KB
Volume
56
Category
Article
ISSN
0031-8965

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Microwave heating was utilized for low-temperature crystallization of amorphous Si (a-Si) films. Microwave heating lowered the annealing temperature and reduced the annealing time. By microwave heating the hydrogen in the amorphous films was diffused out long before the nucleation of polycrystalline