Soft x-ray projection lithography using a high repetition rate laser-induced x-ray source for sub- 100 nanometer lithography processes

✍ Scribed by E. Louis; F. Bijkerk; L. Shmaenok; H.-J. Voorma; M.J. van der Wiel; R. Schlatmann; J. Verhoeven; E.W.J.M. van der Drift; J. Romijn; B.A.C. Rousseeuw; F. Voβ; R. Desor; B. Nikolaus

• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 458 KB
• Volume: 21
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(93)90028-4