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Smooth Continuous Films of Stoichiometric Silicon Carbide from Poly(methylsilyne)

✍ Scribed by M. W. Pitcher; S. J. Joray; P. A. Bianconi


Publisher
John Wiley and Sons
Year
2004
Tongue
English
Weight
140 KB
Volume
16
Category
Article
ISSN
0935-9648

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✦ Synopsis


A new synthesis of the silicon‐network‐backbone polymer poly(methylsilyne) gives a material that is easily converted by pyrolysis to smooth continous films of stoichiometric silicon carbide (see Figure). The films are adherent to the silicon or alumina substrates, and show root mean square roughness of 169 Å over a 500 μm range. Applications in electronics are envisaged.