Small area right angle bends fabricated with hybrid conventional and interference lithography
✍ Scribed by Yaling Zhou; Hua Tan; David J. Klotzkin
- Book ID
- 102515728
- Publisher
- John Wiley and Sons
- Year
- 2007
- Tongue
- English
- Weight
- 346 KB
- Volume
- 49
- Category
- Article
- ISSN
- 0895-2477
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✦ Synopsis
Abstract
A technique to fabricate high‐resolution, photonic features in selected areas aligned to large features such as waveguides, sources, or detectors without e‐beam lithography is demonstrated. This low‐cost parallel technique can be readily extended to produce resonant cavities and photonic‐crystals integrated into conventional waveguide structures. A right‐angle bend using integrated Bragg reflectors is designed and characterized. © 2007 Wiley Periodicals, Inc. Microwave Opt Technol Lett 49: 1300–1303, 2007; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.22408