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Six-band k⋠p calculation of the hole mobility in silicon inversion layers: Dependence on surface orientation, strain, and silicon thickness

✍ Scribed by Fischetti, M. V.; Ren, Z.; Solomon, P. M.; Yang, M.; Rim, K.


Book ID
119959063
Publisher
American Institute of Physics
Year
2003
Tongue
English
Weight
595 KB
Volume
94
Category
Article
ISSN
0021-8979

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